InternLM3

Parameters

8B

Published

Jan 15, 2025

InternLM3 is an AI model developed by Shanghai AI Lab (China), first published in January 2025. It works in the language domain, on tasks such as language modeling/generation and chat.

Epoch AI has no training-compute estimate for this model. The model has 8,000,000,000 parameters.

Epoch AI rates the confidence of this record as confident.

Full record

Organization: Shanghai AI Lab
Country of organization: China
Domain: Language
Task: Language modeling/generation, Chat
Parameters: 8,000,000,000
Epoch confidence: Confident