AI models
OneLLM
Parameters
7B
Published
Dec 6, 2023
OneLLM is an AI model developed by Chinese University of Hong Kong (CUHK) and Shanghai AI Lab (Hong Kong and China), first published in December 2023. It works in the multimodal, language and vision domain, on tasks such as chat, visual question answering, question answering and 3 more.
Epoch AI has no training-compute estimate for this model. The model has 7,000,000,000 parameters. Training ran on 16 NVIDIA A100.
Access: Open weights (non-commercial). Its weights are openly available. It is built on top of Llama 2-7B. The reference paper has 240 citations. Epoch AI rates the confidence of this record as likely.
Full record
- Organization
- Chinese University of Hong Kong (CUHK), Shanghai AI Lab
- Country of organization
- Hong Kong, China
- Domain
- Multimodal, Language, Vision
- Task
- Chat, Visual question answering, Question answering, Image captioning, Video description, Speech recognition (ASR)
- Parameters
- 7,000,000,000
- Training hardware
- NVIDIA A100
- Chips used
- 16
- Training power draw
- 12.7 kW
- Model accessibility
- Open weights (non-commercial)
- Open weights
- Yes
- Base model
- Llama 2-7B
- Citations
- 240
- Epoch confidence
- Likely
SourceEpoch AI, 'AI Models'. Published online at epoch.ai. Retrieved 2026-07-29 from https://epoch.ai/data/ai-models. Licensed under CC BY 4.0.
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